Low-Cost Cyber-Security Breakthrough that Encrypts Individual Chips With a Unique Code Presented at SPIE Advanced Lithography 2018 in San Jose
GRENOBLE, France and DELFT, Netherlands – March 2, 2018 – Leti, a research institute of CEA Tech, and Mapper Lithography, the leading provider of maskless lithography equipment for the semiconductor and nanofabrication industries, today announced a low-cost cyber-security breakthrough that encrypts individual chips with a code.
The non-falsifiable code is generated by using a unique chip design that leverages direct multi-beam writing in a process that fits in a conventional CMOS flow with an extra level of lithography and without photomasks. Throughput on Mapper‘sFLX-1200 tool installed at Leti is compatible with optical systems.
The markets for these chips include data security, traceability and combatting imports of counterfeit chips.
Leti, a specialist in electron-beam lithography, and Mapper, a Dutch company, presented a paper on the breakthrough, “Process development of a maskless N40 via level for security application with multi-beam lithography”, today at SPIE Advanced Lithography 2018 in San Jose, Calif. The paper demonstrates a via patterning integration that is compliant with standard CMOS 40nm process flow.
“Standard optical exposure tools – optical scanners using masks – repeat the identical design on the entire silicon wafer, and cannot fabricate individualized chips,” said Leti’s Isabelle Servin, the lead author of the paper. “Leti applied its deep multi-beam lithography knowhow and Mapper‘s unique maskless fabrication tools to achieve this differentiating, cyber-security chip.”
The maskless lithography system, based on massively parallel electron-beam writing capability developed by Mapper, is designed for high-volume specialty chips and low-volume advanced logic.
Leti and Mapper are demonstrating the breakthrough for their customers at Leti’s facility in Grenoble.
About Mapper
Mapper, based in Delft, The Netherlands, is developing a groundbreaking maskless lithography infrastructure for the semiconductor and nanofabrication industry. The capabilities of a maskless patterning system with 65,000 electron beams enable unique functionalities in high volume nanofabrication and specialized logic. Typical examples are security and identification chips and integrated optics functionalities on image sensors for smart phones. Mapper employs 270 people.
For further information, please visit mapper.nl
About Leti
Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro-& nanotechnologies, tailoring differentiating applicative solutions for global companies, SMEs and startups. Leti tackles critical challenges in healthcare, energy and digital migration. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities. With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network. Follow us on www.leti-cea.com and @CEA_Leti.
CEA Tech is the technology research branch of the French Alternative Energies and Atomic Energy Commission (CEA), a key player in innovative R&D, defence & security, nuclear energy, technological research for industry and fundamental science, identified by Thomson Reuters as the second most innovative research organization in the world. CEA Tech leverages a unique innovation-driven culture and unrivalled expertise to develop and disseminate new technologies for industry, helping to create high-end products and provide a competitive edge.
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