“Fujitsu Microelectronics’ leading-edge technologies require tight control over thickness variation. Density-based fill is a starting point and an improvement over traditional dummy fill, but at smaller features sizes our analysis shows that we need to consider more than just density,” said Noboru Yokota, General Manager of the Technology Development Division at Fujitsu Microelectronics Limited. “The Mentor solution is unique because it can handle complex equations combining all the factors required to compute an optimum fill that achieves our planarity goals with as few added shapes as possible.”
“Our long-term partnership with Fujitsu Microelectronics has resulted in a complete solution that meets Fujitsu Microelectronics’ verification and DFM requirements for their latest IC designs regardless of which process offering is being targeted,” said Joseph Sawicki, Vice President and General Manager of the Design-to-Silicon division at Mentor Graphics. “Our customers are moving to all-Mentor flows because we offer both the best-in-class technology for each design task, as well as the ease of integration and use that can only be achieved with a single integrated platform and tools built from the ground up to work together seamlessly.”
Mentor’s Design-for-Manufacturing Solution
The Calibre nm platform, with the Calibre nmDRC and Calibre LVS tools, has become the golden standard for verification of advanced ICs. Mentor’s comprehensive DFM solution is tightly integrated with the Calibre platform and supports the highest performance designs at advanced nodes with better control of manufacturing variability for cell libraries as well as full-chip layouts. The Calibre DFM solution includes the Calibre LFD™ product, which provides accurate modeling of lithographic process and etch characteristics, and is the standard sign-off flow for litho hotspot and variability analysis for IP and full-chip applications. It is fully integrated with the Calibre nmDRC, Calibre LVS (Layout vs. Schematic) and Calibre xRC products, allowing critical device and interconnect characteristics to be extracted based on accurately-modeled, “as-built” contour geometries. The resulting physical data can be plugged into a SPICE simulator to produce an accurate timing simulation of how physical blocks will actually perform.
The Calibre DFM solution also includes the Calibre YieldAnalyzer and Calibre YieldEnhancer products for automated CAA analysis and fixing. The YieldEnhancer tool includes a SmartFill intelligent fill capability, which performs metal fills based on metal density and density gradients. The Calibre CMPAnalyzer tool enables CMP planarity analysis and fill enhancement based on comprehensive, foundry-specific thickness models. Together, these products comprehensively address the variability issues of manufacturing at 65nm and below by making the physical design flow more process-aware and robust, reducing yield surprises late in the development cycle.
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $800 million and employs approximately 4,500 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks and LFD and xRC are trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)
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