Leading Semiconductor Companies Look to Dassault Systèmes to Improve Design Collaboration and Management

Gantry Group Survey Finds Dassault Systèmes ENOVIA Helps Companies Meet Industry Challenges by Managing Multi-Site Design, Improving Productivity and Maximizing IP Re-use

 

LOWELL, MA – November 12, 2008 – Dassault Systèmes (DS) (Euronext Paris: #13065, DSY.PA), a world leader in 3D and Product Lifecycle Management (PLM) solutions announced a new white paper from the Gantry Group which found that semiconductor companies using ENOVIA PLM solutions reported a number of clear benefits including a 74% increase in multi-site designs, a 46% savings in design engineering time and a 32% increase in product quality.

The study conducted by the Gantry Group, a technology research and ROI analysis company, entitled ROI Impact Analysis of ENOVIA Synchronicity DesignSync Data Manager, was based on a series of in-depth interviews with more than 15 of the top semiconductor companies who have deployed the ENOVIA Synchronicity DesignSync Data Manager solution.  

“In today’s economy, semiconductor companies cannot afford to waste time and money on an extensive, error-filled production process, nor can they afford to miss the small window they have to get new products out to market,” said Rick Stanton, Director, Global Semiconductor Strategy & Solutions ENOVIA R&D, Dassault Systèmes.  “The cost and timing pressures to ‘get it right the first time’ highlighted in the Gantry white paper demonstrate exactly why it is so important to have a strong collaboration and design management tool in place.”

ENOVIA Synchronicity DesignSync enables semiconductor companies to streamline business processes and reduce new product development time through one cohesive source of information that allows management and collaboration of design information, as well as visibility into the development process of each and every product.  Customers are able to improve engineering efficiency through implementing comprehensive IP Reuse and hierarchical, top-down design methodologies, decreasing costs, increasing first-sample success rate and reducing the design productivity gap.  For more information on ENOVIA Synchronicity DesignSync and other ENOVIA solutions for the semiconductor industry, please visit the company’s Web site.

Email Contact

Featured Video
Jobs
GEOGRAPHIC INFORMATION SYSTEM (GIS) COORDINATOR for Lassen County at Susanville, California
Geodetic Analyst, GIS Center (1282) for Idaho State University at Pocatello, Idaho
GIS Analyst for San Bernardino County Transportation Authority at San Bernardino, California
Senior Principal Mechanical Engineer for General Dynamics Mission Systems at Canonsburg, Pennsylvania
Upcoming Events
Esri User Conference 2024 at san diego CA - Jul 15 - 19, 2024
URISA GIS Leadership Academy at Chicago IL - Aug 12 - 16, 2024
Commercial UAV Expo 2024 at Caesars Forum Las Vegas NV - Sep 3 - 5, 2024
Intergeo 2024 at Messe Stuttgart Messepiazza 1 Stuttgart Germany - Sep 24 - 26, 2024



© 2024 Internet Business Systems, Inc.
670 Aberdeen Way, Milpitas, CA 95035
+1 (408) 882-6554 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering EDACafe - Electronic Design Automation TechJobsCafe - Technical Jobs and Resumes  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy PolicyAdvertise